Photo-deprotection patterning of self-assembled monolayers
نویسندگان
چکیده
منابع مشابه
Nanoscale patterning of self-assembled monolayers using DNA nanostructure templates.
We describe a method to pattern arbitrary-shaped silane self-assembled monolayers (SAMs) with nm scale resolution using DNA nanostructures as templates. The DNA nanostructures assembled on a silicon substrate act as a soft-mask to negatively pattern SAMs. Mixed SAMs can be prepared by back filling the negative tone patterns with a different silane.
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Self-assembled monolayers (SAMs) form when organic molecules spontaneously chemisorb on the surfaces of solids (e.g. organic thiols and disulfides on gold, silver, and copper or carboxylic acids on the surface of alumina).1'2 The most robust and best characterized SAMs are those comprising alkanethiolates on gold.l By variation of the length of the alkane chain and the identityof the functional...
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We present a procedure for forming a poly(ethylene glycol) (PEG) trimethoxysilane self-assembled monolayer (SAM) on a silicon substrate with gold microelectrodes. The PEG-SAM is formed in a single assembly step and prevents biofouling on silicon and gold surfaces. The SAM is used to coat microelectrodes patterned with standard, positive-tone lithography. Using the microtubule as an example, we ...
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Over the past two decades, self assembled monolayers (SAMs) (Love et al., 2005; Smith et al., 2004; Ulman, 1996) have been extensively studied due to their many applications in various fields such as electrochemistry (Eckerman et al., 2010), biosensors (Nyquist et al., 2000), protein separation (Chun and Stroeve, 2002) and enantiomer separation (Mastai, 2009). SAMs are organic assemblies formed...
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ژورنال
عنوان ژورنال: Journal of Experimental Nanoscience
سال: 2007
ISSN: 1745-8080,1745-8099
DOI: 10.1080/17458080701675780